Sustained oscillation in simple models for chemical vapor deposition
Simple models for the chemical vapor deposition of carbide films are developed and their dynamic behavior is analyzed. By performing a parameter search, certain sets of model parameters were identified that yield stable limit cycles for the gas phase reagent concentrations at the substrate surface....
|Journal Title:||Thin Solid Films Vol. 207; no. 1-2; pp. 57 - 64|
|Authors:||C. Michael Kelly, Dorothy Skaf|