Sustained oscillation in simple models for chemical vapor deposition

Simple models for the chemical vapor deposition of carbide films are developed and their dynamic behavior is analyzed. By performing a parameter search, certain sets of model parameters were identified that yield stable limit cycles for the gas phase reagent concentrations at the substrate surface....

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Journal Title: Thin Solid Films Vol. 207; no. 1-2; pp. 57 - 64
Authors: C. Michael Kelly, Dorothy Skaf
Format: Article
Published: Jan 1992
Online Access: Full Text