Kinetics of chemical vapor deposition of tungsten carbide

Hard tungsten carbide based coatings were deposited by chemical vapor deposition (CVD) at low temperatures onto metal substrates by hydrogen reduction of tungsten hexafluoride (WF6) in the presence of dimethyl ether (DME). These coatings contain a mixture of tungsten and tungsten carbide in the form...

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Journal Title: Thin Solid Films Vol. 219; no. 1-2; pp. 103 - 108
Authors: C. Michael Kelly, D. Garg, P.N. Dyer
Format: Article
Published: Jan 1992
Subjects:
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