Kinetics of chemical vapor deposition of tungsten carbide
Hard tungsten carbide based coatings were deposited by chemical vapor deposition (CVD) at low temperatures onto metal substrates by hydrogen reduction of tungsten hexafluoride (WF6) in the presence of dimethyl ether (DME). These coatings contain a mixture of tungsten and tungsten carbide in the form...
|Journal Title:||Thin Solid Films Vol. 219; no. 1-2; pp. 103 - 108|
|Authors:||C. Michael Kelly, D. Garg, P.N. Dyer|